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Dynamic Cu0/Cu+ Interface Promotes Acidic CO2 Electroreduction
ACS Catalysis ( IF 12.9 ) Pub Date : 2024-05-13 , DOI: 10.1021/acscatal.4c01516
Yunling Jiang 1 , Haobo Li 1 , Chaojie Chen 1 , Yao Zheng 1 , Shi-Zhang Qiao 1
Affiliation  

Acidic CO2 electroreduction reaction (CO2RR) shows advantages in high carbon utilization efficiency yet encounters great challenges in suppressing undesired hydrogen evolution competition and increasing C2+ product selectivity. Although it is known that Cu0/Cu+ interfaces are conducive to C–C coupling processes, the oxidation state of copper cannot be well maintained under the strong reductive condition and large current electrolysis operation. Herein, we propose an I2 addition involved strategy to protect the oxidation state of Cu and promote dynamic Cu0/Cu+ interfaces during acidic CO2RR. With the addition of I2 in the electrolyte, a high C2+ product Faraday efficiency of above 70% can be achieved at 0.4–0.6 A cm–2 even under a low K+ concentration of 0.3 M, which is comparable to those reported performances with almost ten times higher K+ concentrations (2–3 M). This low K+ concentration in electrolytes significantly avoids salt crystallization in the CO2 transport channel to enhance the electrolyzer’s stability. As proved by the surface Pourbaix diagram and experimental results, adding excessive I2 into the electrolyte boosts the generation of CuI; also, CuI and metallic Cu coexist under electrochemical reduction conditions, demonstrating that a redox loop of Cu → CuI → Cu exists. The loop holds the key to constructing the dynamic Cu0/Cu+ interface, which is tightly bound to the adsorption of the *CO reaction intermediate and further promotes the C–C coupling process.

中文翻译:


动态 Cu0/Cu+ 界面促进酸性 CO2 电还原



酸性CO 2 电还原反应(CO 2 RR)显示出碳利用率高的优势,但在抑制不希望的析氢竞争和增加C 2+ 产物方面遇到了巨大挑战选择性。尽管已知Cu 0 /Cu + 界面有利于C-C耦合过程,但在强还原条件和大电流电解下,铜的氧化态不能得到很好的维持手术。在此,我们提出了一种 I 2 加成策略,以保护 Cu 的氧化态并促进酸性 CO 2 /Cu + 界面 RR。通过在电解液中添加 I 2 ,即使在 0.4–0.6 A cm –2 条件下,也能实现 70% 以上的高 C 2+ 产物法拉第效率在 0.3 M 的低 K + 浓度下,这与报道的 K + 浓度 (2-3 M) 几乎十倍的性能相当。电解质中的低 K + 浓度显着避免了 CO 2 传输通道中的盐结晶,从而增强了电解槽的稳定性。表面普贝图和实验结果证明,电解液中添加过量的I 2 会促进CuI的生成;此外,CuI 和金属 Cu 在电化学还原条件下共存,证明存在 Cu → CuI → Cu 的氧化还原回路。该环是构建动态Cu 0 /Cu + 界面的关键,该界面与*CO反应中间体的吸附紧密结合,进一步促进C-C偶联过程。
更新日期:2024-05-13
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